Abstract:
Photoemission studies of the electronic structure of the Cs/nano-SiC/Si(111)-4∘ nanointerface are for the first time carried out with the use of synchrotron radiation in the photon energy range 120–450 eV. The in situ experiments are conducted in the case of submonolayer Cs coating of the surface of an epitaxial SiC layer grown on the vicinal surface Si(111)-4∘ by a new method of substrate-atom substitution. Modification of the valence-band spectra and the C 1s and Si 2p core levels is studied. The appearance of Cs-induced surface states, with binding energies of 1.2 and 7.4 eV, and a sharp change in the spectrum of the C 1s core level with the appearance of two additional modes are found. The evolution of the spectra shows that the Cs/nano-SiC/Si(111)-4∘ interface is formed due to charge transfer from Cs adatoms to surface atoms at terraces and steps of the vicinal surface. It is found that the structure of the C layer is nontrivial and involves energetically different carbon states.
Citation:
G. V. Benemanskaya, P. A. Dementev, S. A. Kukushkin, M. N. Lapushkin, A. V. Osipov, B. V. Senkovskiy, “The C 1s core level spectroscopy of carbon atoms at the surface SiC/Si(111)-4∘ layer and Cs/SiC/Si(111)-4∘ interface”, Fizika i Tekhnika Poluprovodnikov, 50:10 (2016), 1348–1352; Semiconductors, 50:10 (2016), 1327–1332
\Bibitem{BenDemKuk16}
\by G.~V.~Benemanskaya, P.~A.~Dementev, S.~A.~Kukushkin, M.~N.~Lapushkin, A.~V.~Osipov, B.~V.~Senkovskiy
\paper The C 1$s$ core level spectroscopy of carbon atoms at the surface SiC/Si(111)-4$^\circ$ layer and Cs/SiC/Si(111)-4$^\circ$ interface
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2016
\vol 50
\issue 10
\pages 1348--1352
\mathnet{http://mi.mathnet.ru/phts6337}
\elib{https://elibrary.ru/item.asp?id=27369011}
\transl
\jour Semiconductors
\yr 2016
\vol 50
\issue 10
\pages 1327--1332
\crossref{https://doi.org/10.1134/S1063782616100080}
Linking options:
https://www.mathnet.ru/eng/phts6337
https://www.mathnet.ru/eng/phts/v50/i10/p1348
This publication is cited in the following 3 articles:
S.A. Kukushkin, A.M. Mizerov, A.V. Osipov, A.V. Redkov, S.N. Timoshnev, “Plasma assisted molecular beam epitaxy of thin GaN films on Si(111) and SiC/Si(111) substrates: Effect of SiC and polarity issues”, Thin Solid Films, 646 (2018), 158
S. A. Kukushkin, K. Kh. Nussupov, A. V. Osipov, N. B. Beisenkhanov, D. I. Bakranova, “X-ray reflectometry and simulation of the parameters of SiC epitaxial films on Si(111), grown by the atomic substitution method”, Phys. Solid State, 59:5 (2017), 1014–1026
S.A. Kukushkin, K. Kh. Nussupov, A.V. Osipov, N.B. Beisenkhanov, D.I. Bakranova, “Structural properties and parameters of epitaxial silicon carbide films, grown by atomic substitution on the high-resistance (111) oriented silicon”, Superlattices and Microstructures, 111 (2017), 899