Abstract:
N-allylated derivatives with a modification degree of 80% were obtained by reacting poly[N,N′-(1,3-phenylene)isophthalamide] with allyl bromide in the presence of a strong base. Using the obtained functionalized polyamide and pentaerythritol tetrakis(3-mercaptopropionate), we formulated new photo- sensitive compositions capable of forming crosslinked structures due to UV-initiated thiol–ene polymerization. High-resolution 3D objects that are heat resistant up to 380 °C were formed using digital light processing (DLP) 3D printing
Citation:
O. S. Korkunova, B. Ch. Kholkhoev, V. F. Burdukovskii, “Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials”, Mendeleev Commun., 32:2 (2022), 231–233
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https://www.mathnet.ru/eng/mendc623
https://www.mathnet.ru/eng/mendc/v32/i2/p231
This publication is cited in the following 11 articles:
James Anthony Dicks, Chris Woolard, “Thiol‐X Chemistry: A Skeleton Key Unlocking Advanced Polymers in Additive Manufacturing”, Macro Materials & Eng, 2025
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Dmitriy A. Sapozhnikov, Olga A. Melnik, Alexander V. Chuchalov, Roman S. Kovylin, Sergey A. Chesnokov, Dmitriy A. Khanin, Galina G. Nikiforova, Alexey F. Kosolapov, Sergey L. Semjonov, Yakov S. Vygodskii, “Soluble Fluorinated Cardo Copolyimide as an Effective Additive to Photopolymerizable Compositions Based on Di(meth)acrylates: Application for Highly Thermostable Primary Protective Coating of Silica Optical Fiber”, IJMS, 25:10 (2024), 5494
Chongjun Wu, Yutian Chen, Xinyi Wei, Junhao Xu, Dongliu Li, “Morphology analysis and process optimization of μ-SLA 3D manufactured micro-nano conic structure”, JIMSE, 5:1 (2024), 203
Mohammad Harun-Ur-Rashid, Abu Bin Imran, Md. Abu Bin Hasan Susan, Reference Module in Materials Science and Materials Engineering, 2024
David Böcherer, Yuanyuan Li, Christof Rein, Santiago Franco Corredor, Peilong Hou, Dorothea Helmer, “High‐Resolution 3D Printing of Dual‐Curing Thiol‐Ene/Epoxy System for Fabrication of Microfluidic Devices for Bioassays”, Adv Funct Materials, 34:29 (2024)
Aaron Priester, Jimmy Yeng, Krista Hilmas, Anthony J. Convertine, “One pot synthesis of thiol-functional nanoparticles”, Polym. Chem., 14:10 (2023), 1085
Bato Ch. Kholkhoev, Kseniia N. Bardakova, Evgeniy O. Epifanov, Zakhar A. Matveev, Taisiya A. Shalygina, Evgeniy B. Atutov, Svetlana Yu. Voronina, Peter S. Timashev, Vitaliy F. Burdukovskii, “A photosensitive composition based on an aromatic polyamide for LCD 4D printing of shape memory mechanically robust materials”, Chemical Engineering Journal, 454 (2023), 140423
Hesam Moghadasi, Md Tusher Mollah, Deepak Marla, Hamid Saffari, Jon Spangenberg, “Computational Fluid Dynamics Modeling of Top-Down Digital Light Processing Additive Manufacturing”, Polymers, 15:11 (2023), 2459
Bato Ch. Kholkhoev, Kseniia N. Bardakova, Evgeniy O. Epifanov, Zakhar A. Matveev, Taisiya A. Shalygina, Evgeniy B. Atutov, Svetlana Yu. Voronina, Peter Timashev, Vitaliy F. Burdukovskii, “A Photosensitive Composition Based on an Aromatic Polyamide for Lcd 4d Printing of Shape Memory Mechanically Robust Materials”, SSRN Journal, 2022
B. Ch. Kholkhoev, Z. A. Matveev, A. N. Nikishina, V. F. Burdukovskii, “Polybenzimidazole-based thiol-ene photosensitive composition for DLP 3D printing”, Mendeleev Commun., 32:6 (2022), 813–815
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